PRESS RELEASES

Quantexa Announces General Availability of Quantexa Unify for Microsoft Fabric

Quantexa Announces General Availability of Quantexa Unify for Microsoft Fabric Leave a reply AI-powered integration seamlessly delivers unified, trusted data for analytics and decision-making within the Microsoft Fabric platform LONDON, Nov. 18, 2025 (GLOBE NEWSWIRE) — Quantexa, the global pioneer in Decision Intelligence (DI), today announced the general availability of

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Quantexa Announces General Availability of Quantexa Unify for Microsoft Fabric

AI-powered integration seamlessly delivers unified, trusted data for analytics and decision-making within the Microsoft Fabric platform LONDON, Nov. 18, 2025 (GLOBE NEWSWIRE) — Quantexa, the global pioneer in Decision Intelligence (DI), today announced the general availability of Quantexa Unify for Microsoft Fabric, marking a major milestone in helping enterprises build

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International Air Chiefs Gather for the 12th DIACC in Dubai

International Air Chiefs Gather for the 12th DIACC in Dubai Leave a reply His Excellency Mohamed bin Mubarak bin Fadhel Al Mazrouei, UAE Minister of State for Defence Affairs, inaugurated the 12th edition of the Dubai International Air Chiefs Conference. DUBAI, United Arab Emirates, Nov. 18, 2025 (GLOBE NEWSWIRE) —

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International Air Chiefs Gather for the 12th DIACC in Dubai

DUBAI, United Arab Emirates, Nov. 18, 2025 (GLOBE NEWSWIRE) — Under the patronage of His Highness Sheikh Mohammed bin Rashid Al Maktoum, Vice President and Prime Minister of the UAE and Ruler of Dubai, His Excellency Mohamed bin Mubarak bin Fadhel Al Mazrouei, UAE Minister of State for Defence Affairs,

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Nearfield Instruments Signs Multi-Year Development Project to Advance Semiconductor Metrology

ROTTERDAM, The Netherlands, Nov. 18, 2025 (GLOBE NEWSWIRE) — Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, today announced a strategic development project to accelerate innovation in semiconductor metrology. As part of a multi-year collaboration, Nearfield Instruments will deploy its flagship system,

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Nearfield Instruments Signs Multi-Year Development Project to Advance Semiconductor Metrology

Nearfield Instruments Signs Multi-Year Development Project to Advance Semiconductor Metrology Leave a reply ROTTERDAM, The Netherlands, Nov. 18, 2025 (GLOBE NEWSWIRE) — Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, today announced a strategic development project to accelerate innovation in semiconductor metrology.

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