Kuala lumpur: Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, today announced a strategic development project to accelerate innovation in semiconductor metrology.

According to BERNAMA News Agency, as part of a multi-year collaboration, Nearfield Instruments will deploy its flagship system, QUADRA, at Imec's advanced R and D facility in Leuven. The two organizations will jointly develop next-generation metrology solutions to address critical challenges across the semiconductor manufacturing value chain.